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Ultimate Thin Vertical p-n Junction Composed of 2D Layered Molybdenum Disulfide

机译:由2D层状钼组成的极薄垂直p-n结   二硫

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摘要

Semiconducting 2D crystals are currently receiving significant attention dueto their great potential to be an ultra-thin body for efficient electrostaticmodulation which enables to overcome the limitations of silicon technology.Here we report that, as a key building block for 2D semiconductor devices,vertical p-n junctions are fabricated in ultrathin MoS2 by introducing AuCl3and benzyl viologen dopants. Unlike usual unipolar MoS2, the MoS2 p-n junctionsshow (i) ambipolar carrier transport, (ii) current rectification via modulationof potential barrier in films thicker than 8 nm, and (iii) reversed currentrectification via tunneling in films thinner than 8 nm. The ultimate thinnessof the vertical p-n homogeneous junctions in MoS2 is experimentally found to be3 nm, and the chemical doping depth is found to be 1.5 nm. The ultrathin MoS2p-n junctions present a significant potential of the 2D crystals for flexible,transparent, high-efficiency electronic and optoelectronic applications.
机译:半导体2D晶体由于具有成为高效静电调制的超薄物体的巨大潜力而​​成为潜在的挑战,这种超薄物体可以克服硅技术的局限性。在此我们报道,垂直pn结作为2D半导体器件的关键组成部分通过引入AuCl3和苄基紫精掺杂剂,可以在超薄MoS2中制备二氧化硫。与通常的单极MoS2不同,MoS2 p-n结显示(i)双极性载流子传输,(ii)厚度大于8 nm的薄膜通过势垒调制进行电流整流,以及(iii)薄膜小于8 nm的隧穿通过反向电流整流。通过实验发现,MoS2中垂直p-n均匀结的最终厚度为3 nm,化学掺杂深度为1.5 nm。超薄MoS2p-n结为柔性,透明,高效电子和光电应用提供了2D晶体的巨大潜力。

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